LiNi0.4Co0.3Mn0.3O2 thin film electrode by aerosol deposition
نویسندگان
چکیده
LiNi0.4Co0.3Mn0.3O2 thin film electrodes are fabricated from LiNi0.4Co0.3Mn0.3O2 raw powder at room temperature without pretreatments using aerosol deposition that is much faster and easier than conventional methods such as vaporization, pulsed laser deposition, and sputtering. The LiNi0.4Co0.3Mn0.3O2 thin film is composed of fine grains maintaining the crystal structure of the LiNi0.4Co0.3Mn0.3O2 raw powder. In the cyclic voltammogram, the LiNi0.4Co0.3Mn0.3O2 thin film electrode shows a 3.9-V anodic peak and a 3.6-V cathodic peak. The initial discharge capacity is 44.6 μAh/cm2, and reversible behavior is observed in charge-discharge profiles. Based on the results, the aerosol deposition method is believed to be a potential candidate for the fabrication of thin film electrodes.
منابع مشابه
Synthesis of Boron-Aluminum Nitride Thin Film by Chemical Vapour Deposition Using Gas Bubbler
Boron included aluminium nitride (B-AlN) thin films were synthesized on silicon (Si) substrates through chemical vapour deposition ( CVD ) at 773 K (500 °C). tert-buthylamine (tBuNH2) solution was used as nitrogen source and delivered through gas bubbler. B-AlN thin films were prepared on Si-100 substrates by varying gas mixture ratio of three precursors. The structural properties of the films ...
متن کاملStructural and Electrochemical Properties of LiNi0.5Mn0.5O2 Thin-Film Electrodes Prepared by Pulsed Laser Deposition
LiNi0.5Mn0.5O2 thin-film electrodes have been prepared by pulsed laser deposition followed by postannealing at different temperatures. The microstructural and morphological characterizations using X-ray diffraction, field-emission-scanning electron microscopy, and Raman spectroscopy measurements show that the structure and phase purity of the thin films are highly dependent on the postannealing...
متن کاملPreparation of Cr-doped TiO2 thin film by sonochemical/CVD method and its visible light photocatalytic activity for degradation of paraoxon
In this work, nanostructured TiO2 and Cr-doped TiO2 thin films were deposited on glass substrate through sonochemical-chemical vapor deposition (CVD) method. The resulting thin films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), UV-visible absorption spectroscopy, and photoluminescence spectroscopy techniques. The TiO2 thin film has nanocubic morphology and ...
متن کاملGrowth, Characterization of Cu Nanoparticles Thin Film by Nd: YAG Laser Pulses Deposition
We report the growth and characterization of Cu nanoparticles thin film of on glass substrate by pulse laser deposition method. The Cu thin film prepared with different energy 50, 60, 70, and 80 mJ. The energy effect on the morphological, structural and optical properties were studied by AFM, XRD and UV-Visible spectrophotometer. Surface topography studied by atomic force microscopy revealed na...
متن کاملProcess Optimization of Deposition Conditions for Low Temperature Thin Film Insulators used in Thin Film Transistors Displays
Deposition process for thin insulator used in polysilicon gate dielectric of thin film transistors are optimized. Silane and N2O plasma are used to form SiO2 layers at temperatures below 150 ºC. The deposition conditions as well as system operating parameters such as pressure, temperature, gas flow ratios, total flow rate and plasma power are also studied and their effects are discussed. The p...
متن کامل